Introduction

  • Theme I: IC Transistor stacking with versatile channels and gates
  • Theme II: Uniform ferroelectric materials and devices
  • Theme III: 2D/1D semiconductor devices targeting 2030 technology
  • Theme IV: Future Semiconductor packaging technologies
  • Theme V: Three-dimensional high-density oxide CMOS devices and applications
  • Theme VI: Future GaN power HEMTs for ubiquitous satellite transceivers